The use of automatic demolding in nanoimprint lithography processes

Autor: S. Merino, H. Schift, A. Retolaza, T. Haatainen. Fecha2007

Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. 

A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.